| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pigment dispersed resist composition for a black matrix and for a color filter excellent in developing property. <P>SOLUTION: In the pigment dispersed resist composition comprising a pigment, an organic solvent, an alkali-soluble resin, a photopolymerizable compound and a photopolymerization initiator, (a) a low-molecular-weight alkali-soluble resin and (b) a high-molecular-weight alkali-soluble resin are contained as the above alkali-soluble resin, wherein the resin (a) is obtained by copolymerizing a styrenic monomer and a carboxylic unsaturated monomer so that a content of the styrenic monomer is made ≥5 mass% based on all the monomers, and has an acid number of 200-300 KOHmg/g and a weight average molecular weight of 1,000-10,000, and the resin (b) is obtained by copolymerizing a carboxylic unsaturated monomer and another radical polymerizable unsaturated monomer, and has an acid number of 50-250 KOHmg/g and a weight average molecular weight of 20,000-70,000. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
