| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition which is used in the manufacturing step of a semiconductor such as an IC, in manufacturing step of a circuit board such as liquid crystals and thermal heads, and other photofabrication steps, having an excellent resolution and line edge roughness; and to provide a method for forming a pattern using the same. <P>SOLUTION: The photosensitive composition contains (A) a resin having a repeating unit of a specific group, whose solubility in an alkaline developer increases by the action of an acid, and the method is disclosed for forming a pattern using the same. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
