DEVICE FOR PROVIDING VAPORS OF A SOLID PRECURSOR TO A PROCESSING DEVICE

摘要

The present invention relates to a device (30) for providing vapors of at least one solid precursor intended to supply a physico-chemical processing device (12), comprising an enclosure (32) capable of containing particles of the solid precursor and comprising an inlet (34) and an outlet (36) , the outlet being intended to be connected to the physico-chemical processing device; and means (42, 43, 44) for circulating a gas between the inlet and the outlet to put the particles of the solid precursor in the form of a fluidized bed, and to convey to the outlet vapors of the solid precursor.