发明名称 |
Apparatus and method for cleaning surfaces of semiconductor wafers using ozone |
摘要 |
An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of cleaning fluid formed on a semiconductor wafer surface to increase the amount of gaseous material that reaches the wafer surface through the boundary layer.
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申请公布号 |
US7051743(B2) |
申请公布日期 |
2006.05.30 |
申请号 |
US20020282562 |
申请日期 |
2002.10.29 |
申请人 |
KIM YONG BAE;JEONG IN KWON;KIM JUNGYUP |
发明人 |
KIM YONG BAE;JEONG IN KWON;KIM JUNGYUP |
分类号 |
B08B3/00;B08B3/02;B08B7/04 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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