MAINTENANCE METHOD, EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE PRODUCING METHOD

摘要

An exposure apparatus emits exposure light (EL) with a space (KS) between specific optical elements (LS1, LS2), out of plural optical elements included in a projection optical system, filled with liquid (LQ). When the exposure light (EL) is not emitted, for example, in maintenance, the liquid (LQ) in the space (KS) is replaced with another function liquid (LK). Influence of liquid to the exposure apparatus is reduced.