发明名称 |
FERROMAGNETIC FILM, MAGNETIC RESISTANCE ELEMENT AND MAGNETIC RANDOM ACCESS MEMORY |
摘要 |
<p>A ferromagnetic film which comprises a ferromagnetic element and a non-magnetic element and has a first portion and a second portion, wherein the first portion has a concentration of a non-magnetic element lower than the average concentration of the non-magnetic element in the ferromagnetic film, and the second portion has a concentration of a non-magnetic element higher than the average concentration of the non-magnetic element in the ferromagnetic film, and wherein the non-magnetic element comprises at least one element selected from the group consisting of Zr, Ti, Nb, Ta, Hf, Mo and W. The above ferromagnetic film is applied to a magnetic free layer of a magnetic resistance element in MRAM.</p> |
申请公布号 |
WO2006054469(A1) |
申请公布日期 |
2006.05.26 |
申请号 |
WO2005JP20539 |
申请日期 |
2005.11.09 |
申请人 |
NEC CORPORATION;KABUSHIKI KAISHA TOSHIBA;ISHIWATA, NOBUYUKI;HONJO, HIROAKI;NISHIYAMA, KATSUYA;NAGASE, TOSHIHIKO |
发明人 |
ISHIWATA, NOBUYUKI;HONJO, HIROAKI;NISHIYAMA, KATSUYA;NAGASE, TOSHIHIKO |
分类号 |
H01F10/16;H01F10/32;H01L21/8246;H01L27/105;H01L43/08;H01L43/10 |
主分类号 |
H01F10/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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