发明名称 |
Method and apparatus for oxidizing nitrides |
摘要 |
A method for oxidizing a nitride film is disclosed, which includes the steps of: providing a nitride film formed on an electrically conductive substrate; irradiating the nitride film with a light beam and getting close to the nitride film with a electrically conductive probe; and exerting a bias between the electrically conductive substrate and the electrically conductive probe. The method can oxidize the nitrides quickly and reduce the cost building a nano-structure in the nitride film. An apparatus for oxidizing a nitride film is also disclosed herewith.
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申请公布号 |
US2006110932(A1) |
申请公布日期 |
2006.05.25 |
申请号 |
US20060324317 |
申请日期 |
2006.01.04 |
申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
TAI HUNG-MING;CHIEN FOREST S. |
分类号 |
H01L21/31;H01L21/26;H01L21/314;H01L21/768 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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