发明名称 SOLID STATE IMAGING DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To improve the sensitivity or quality of an image by realizing a uniform condensing efficiency on the whole by preventing shading over the whole pixel array. SOLUTION: A method of manufacturing a solid state imaging device includes the steps of forming a pixel array constituted by performing two dimensional array of pixels respectively including photoelectric converters on a substrate, providing an upper layer film including wiring and a light shielding layer on this substrate, and, moreover, providing a microlens corresponding each photoelectric converters. The region corresponding to the image pick-up area of the top surface of the upper layer film (interlayer insulating film) is formed in the spherical surface of a concave shape or a convex shape as a microlens formation surface, and the microlens is provided here. Consequently, a distance between the image pick-up lens and each microlens is equalized, a uniform condensing efficiency is realized on the whole, the shading is prevented, and the sensitivity and the quality of the image are improved. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006134911(A) 申请公布日期 2006.05.25
申请号 JP20040318852 申请日期 2004.11.02
申请人 SONY CORP 发明人 NAGANO TAKASHI
分类号 H01L27/14;G02B3/00;H04N5/335;H04N5/361;H04N5/369 主分类号 H01L27/14
代理机构 代理人
主权项
地址