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发明名称
CERIA SLURRY FOR CHEMICAL MECHANICAL POLISHING AND ITS FABRICATION METHOD
摘要
申请公布号
KR20060056519(A)
申请公布日期
2006.05.25
申请号
KR20040095634
申请日期
2004.11.22
申请人
K.C.TECH CO., LTD.;HANYANG HAK WON CO., LTD.
发明人
KIM, DAE HYUNG;HONG, SEOK MIN;JEON, JAE HYUN;KIM, YONG KUK;PARK, JEA GUN;PAIK, UN GYU
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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