| 摘要 |
Provided is an exposure apparatus for exposing a pattern of a reticle mounted on a first stage onto a substrate which is mounted on a second stage through a projection optical system, in which focus calibration can be conducted with high precision and a throughput can be increased. The exposure apparatus includes at least three detection systems capable of simultaneously detecting three or more marks formed at different positions on at least one of the substrate and the second stage through the projection optical system.
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