发明名称 |
PATTERN DATA PRODUCING METHOD, PATTERN VERIFICATION METHOD, PHOTO MASK PRODUCING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
A pattern data correction method is disclosed, which comprises preparing an integrated circuit pattern, setting a tolerance to the pattern that is allowable error range when the pattern is transferred on a substrate, creating a target pattern within the tolerance, and making correction for the target pattern to make a first correction pattern under a predetermined condition. |
申请公布号 |
KR20060048140(A) |
申请公布日期 |
2006.05.18 |
申请号 |
KR20050044940 |
申请日期 |
2005.05.27 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
NOJIMA SHIGEKI;TANAKA SATOSHI;KOTANI TOSHIYA;IZUHA KYOKO;INOUE SOICHI |
分类号 |
H01L21/00;G03F1/36;G03F1/68;G03F1/70;G03F7/20;G06F17/50;G21K5/10;H01L21/027 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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