COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

摘要

Compositions (particularly antireflective coating compositions or "ARCs") are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. More particularly, the invention relates to organic coating compositions, particularly antireflective coating compositions, that contain a polyester resin component that contains repeat units that comprise phenolic and/or hydroxyalkylcyanurate groups.