| 摘要 |
PROBLEM TO BE SOLVED: To reduce particles in a substrate processor provided with a rotation mechanism. SOLUTION: The substrate processor is provided with a processing container 1 dividing a processing space for processing a substrate to be processed W, a substrate supporting body 12 supporting the substrate to be processed W in the processing container, a movable member 11 which is directly or indirectly connected to the substrate supporting body 12, and a rotor 10 rotating the substrate supporting body 12 through the movable member 11 by rotation while it abuts on the movable member 11. The movable member 11 and the rotor 10 are formed of ceramic materials whose values of fracture toughness defined in JIS R1607, and/or whose values of three point flexural strength defined in JIS R1601 differ. COPYRIGHT: (C)2006,JPO&NCIPI |
