FORMING METHOD OF RESIST PATTERN, MANUFACTURING METHOD OF PATTERN SUBSTRATE, FORMING DEVICE OF RESIST PATTERN, MANUFACTURING METHOD OF DISPLAY DEVICE AND MANUFACTURING DEVICE OF DISPLAY DEVICE

摘要

A resist pattern formation apparatus includes a resist layer formation section of forming a resist layer on a substrate, an exposure section of applying light to the resist layer through a mask pattern, a development section of developing the resist layer, a defect inspection section of inspecting defect in a pattern of the resist layer, and a repair section of repairing a defect part of the pattern of the resist layer if needed according to an inspection result.