发明名称 |
Method and apparatus for megasonic cleaning of patterned substrates |
摘要 |
A system for cleaning a semiconductor substrate is provided. The system includes transducers for generating acoustic energy oriented in a substantially perpendicular direction to a surface of a semiconductor substrate and an acoustic energy oriented in a substantially parallel direction to the surface of the semiconductor substrate. Each orientation of the acoustic energy may be simultaneously or alternately generated.
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申请公布号 |
US7040330(B2) |
申请公布日期 |
2006.05.09 |
申请号 |
US20030371603 |
申请日期 |
2003.02.20 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
BOYD JOHN M.;RAVKIN MICHAEL;REDEKER FRED C. |
分类号 |
B08B3/00;B08B3/12;H01L21/00 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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