PHOTORESIST COMPOSITIONS WITH CYCLIC OLEFIN POLYMERS AND HYDROPHOBIC NON-STEROIDAL MULTI-ALICYCLIC ADDITIVES.

摘要

ACID-CATALYZED POSITIVE PHOTORESIST COMPOSITIONS WHICH ARE IMAGEABLE WITH 193NM RADIATION AND ARE DEVELOPABLE TO FROM PHOTORESIST STRUCTURE OF HIGH RESOLUTION AND HIGH ETCH RESISTANCE ARE ENABLE BY THE USE OF A COMBINATION OF CYCLIC OLEFIN POLYMER, PHOTOSENSITIVE ACID GENERATOR AND A HYDROPHOBIC NON-STEROIDAL NULTI-ALICYCLIC COMPONENT CONTAINING PLURAL ACID LINKING GROUPS.THE CYCLIC OLEFIN POLYMERS PREFERABLY CONTAIN I) CYCLIC OLEFIN UNITS HAVING POLAR FUNCTIONAL MOIETIES , II) CYCLIC OLEFIN UNITS HAVING ACID LABILE MOIETIES THAT INHIBIT SOLUBILITY IN AQUEOUS ALKALINE SOLUTIONS.