发明名称 ELECTRON BEAM IRRADIATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiation device capable of obtaining a condition without charging up an electrode surface of an electrostatic deflection apparatus and an electrostatic lens, maintaining highly precise exposure for a long time, and having an anti-oxidation function of the electrode surface for a long period of time. SOLUTION: The electron beam irradiation device having an electron gun generating an electron beam and an electrostatic deflection apparatus controlling the electron beam is such that an electrode surface of a deflection electrode 61 formed on a surface inside a cylindrical electrode base material 60 structuring an electrostatic deflection apparatus is covered with a metal coating 62 as a conductive oxide coating. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006108119(A) 申请公布日期 2006.04.20
申请号 JP20050373397 申请日期 2005.12.26
申请人 TOSHIBA CORP 发明人 OTA TAKUMI;ANDO KOJI;SUGIHARA KAZUYOSHI;OKUMURA KATSUYA
分类号 H01J37/147;H01L21/027 主分类号 H01J37/147
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