APPARATUS AND METHOD FOR PATTERN EXPOSURE, PHOTOMASK USED THEREFOR, DESIGN METHOD FOR THE PHOTOMASK, ILLUMINATING SYSTEM THEREFOR AND IMPLEMENTING METHOD FOR THE ILLUMINATING SYSTEM

摘要

The mask has polarization patterns (210) arranged on a transparent substrate (200), which includes lines extending parallel to each other and the lines are opaque to light. The lattice patterns occupying spaces between the lines, have a series of stripes opaque to light and extending perpendicular to the lines of line/space pattern. The stripes have a pitch smaller than wavelength of light. Independent claims are also included for the following: (1) composite polarization modified illuminating system; (2) exposure apparatus; and (3) method of forming line/space circuit pattern.