| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a defect detecting unit, a defect detecting method capable of detecting a defect with high sensitivity, and a manufacturing method for a pattern substrate. <P>SOLUTION: This defect detecting unit concerned in one embodiment of the present invention is provided with a light source 1, an objective lens 3 for converging a light beam from the light source 1 to get incident into a sample 4, a detector 6 for receiving reflected light from a surface of the sample and for outputting an output signal, a beam splitter 2 for separating the reflected beam from the light beam, a scanning means for conducting scan with the light beam, and a shielding plate 7 arranged in an optical path between the splitter and the photo detector to shield the optical path in a half one side along a direction corresponding to a scanning direction of the light beam in the sample, and the propriety of the defect is determined on the basis of a correlation value between a reference signal based on the output signal in a defective portion serving as a reference for determining the defect, and a detection signal based on the output signal when scanned on the sample. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
