| 摘要 |
A processing method of an exhaust gas which comprises a step (A) adding a halogen-based gas-absorbing liquid to an adsorbent and a step (B) bringing the exhaust gas containing a halogen-based gas discharged from semiconductor manufacturing facilities into contact with the adsorbent, to remove the halide-based gas from the exhaust gas. A processing apparatus of an exhaust gas, which comprises an inlet for the exhaust gas containing a halogen-based gas discharged from semiconductor manufacturing facilities, a filling part of an adsorbent, means for adding a halogen-based gas-absorbing liquid to the filling part and an outlet of the processed gas. A processing method and a processing apparatus both for an exhaust gas containing the halogen-based gas discharged from semiconductor manufacturing facilities without requiring to frequently replace a cleaning agent with a new one, without jeopardy of causing fire even when processing a dry exhaust gas containing a highly reactive gas, and capable of easily reducing a concentration of the halogen-based gas among the gas after being processed is provided.
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