发明名称 MANUFACTURING METHOD OF PATTERN-FORMING BODY
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a high-quality pattern-forming body which makes only an objective region accurately liquid-phobic, when forming liquid-philic and liquid-phobic patterns utilizing plasma irradiation. <P>SOLUTION: The manufacturing method of pattern forming body comprises a plasma irradiation process of making the surface of a light-shielding part liquid-phobic by irradiating a patterning substrate having base material made of inorganic material and the light-shielding part which is formed on the base material and contains at least light-shielding material and resin with plasma, using a fluorine compound as an inlet gas and an impurity removal process of irradiating an opening part, formed dividedly in the light-shielding part with energy and removing impurities on the surface of the opening part formed dividedly in the light-shielding part. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006098527(A) 申请公布日期 2006.04.13
申请号 JP20040282294 申请日期 2004.09.28
申请人 DAINIPPON PRINTING CO LTD 发明人 MATSUKAWA REIO;YAMAMOTO MANABU;KOBAYASHI HIRONORI
分类号 G02B5/20;B05D3/04;G02F1/1335 主分类号 G02B5/20
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