发明名称 |
MANUFACTURING METHOD OF PATTERN-FORMING BODY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a high-quality pattern-forming body which makes only an objective region accurately liquid-phobic, when forming liquid-philic and liquid-phobic patterns utilizing plasma irradiation. <P>SOLUTION: The manufacturing method of pattern forming body comprises a plasma irradiation process of making the surface of a light-shielding part liquid-phobic by irradiating a patterning substrate having base material made of inorganic material and the light-shielding part which is formed on the base material and contains at least light-shielding material and resin with plasma, using a fluorine compound as an inlet gas and an impurity removal process of irradiating an opening part, formed dividedly in the light-shielding part with energy and removing impurities on the surface of the opening part formed dividedly in the light-shielding part. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006098527(A) |
申请公布日期 |
2006.04.13 |
申请号 |
JP20040282294 |
申请日期 |
2004.09.28 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
MATSUKAWA REIO;YAMAMOTO MANABU;KOBAYASHI HIRONORI |
分类号 |
G02B5/20;B05D3/04;G02F1/1335 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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