发明名称 OBLIQUE REFLECTOR NORMAL INCIDENCE COLLECTOR SYSTEM FOR LIGHT SOURCES, IN PARTICULAR FOR EUV PLASMA DISCHARGE SOURCES
摘要 The invention relates to a collector system for a light source, in particular, a EUV light source, comprising a first collector mirror and a second collector mirror, whereby the first collector mirror reflects the first beam path emitted by the light source into a second beam path leading to the second collector mirror. The first collector mirror is a concave normal-incidence mirror, the aperture angle accepted by the first collector mirror is greater or essentially the same as the second aperture angle, emitted by the first collector mirror and accepted by the second collector mirror.
申请公布号 WO2005031748(A8) 申请公布日期 2006.03.30
申请号 WO2003EP09466 申请日期 2003.08.27
申请人 CARL ZEISS SMT AG;SINGER, WOLFGANG 发明人 SINGER, WOLFGANG
分类号 G03F7/20;G11C11/22 主分类号 G03F7/20
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