METHOD OF FORMING GATE WITH USING LAYER-GROWTH PROCESSING AND GATE STRUCTURE THEREBY,申请号KR20040076910-传众专利搜索

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发明名称	METHOD OF FORMING GATE WITH USING LAYER-GROWTH PROCESSING AND GATE STRUCTURE THEREBY
摘要
申请公布号	KR20060027970(A)	申请公布日期	2006.03.29
申请号	KR20040076910	申请日期	2004.09.24
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	JIN, YOU SEUNG;MAEDA SHIGENOBU
分类号	H01L21/336;H01L21/28	主分类号	H01L21/336
代理机构		代理人
主权项
地址

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