发明名称 Method and apparatus for determining chemistry of part's residual contamination
摘要 An electronic monitoring device that archives chemical exposures of a consumable part inside a semiconductor processing tool. The monitoring device includes a memory unit dedicated to the consumable part and which stores a history of the chemical exposures of the consumable part, a processor in communication with the memory unit, and a power supply circuit that supplies power to the processor and the memory unit.
申请公布号 US7020583(B2) 申请公布日期 2006.03.28
申请号 US20040767346 申请日期 2004.01.30
申请人 TOKYO ELECTRON LIMITED 发明人 CALABRESE PAULA;MITROVIC ANDREJ
分类号 H01L21/66;G06F19/00;H01L21/00 主分类号 H01L21/66
代理机构 代理人
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