发明名称 |
Method and apparatus for determining chemistry of part's residual contamination |
摘要 |
An electronic monitoring device that archives chemical exposures of a consumable part inside a semiconductor processing tool. The monitoring device includes a memory unit dedicated to the consumable part and which stores a history of the chemical exposures of the consumable part, a processor in communication with the memory unit, and a power supply circuit that supplies power to the processor and the memory unit.
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申请公布号 |
US7020583(B2) |
申请公布日期 |
2006.03.28 |
申请号 |
US20040767346 |
申请日期 |
2004.01.30 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
CALABRESE PAULA;MITROVIC ANDREJ |
分类号 |
H01L21/66;G06F19/00;H01L21/00 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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