| 摘要 |
PROBLEM TO BE SOLVED: To provide a single monomolecular film having evenness of film thickness and high regularity of molecular arrangement, and to provide its built up film and their manufacturing method. SOLUTION: This organic thin film uses an organic compound represented by a general formula Si(A<SP>1</SP>) (A<SP>2</SP>) (A<SP>3</SP>)-B-Si (A<SP>4</SP>) (A<SP>5</SP>) (A<SP>6</SP>) (where A<SP>1</SP>-A<SP>6</SP>are each a hydrogen atom, a halogen atom, an alkoxy group or an alkyl group and satisfy a relation of A<SP>1</SP>-A<SP>3</SP>>A<SP>4</SP>-A<SP>6</SP>for elimination reaction property, and B is a divalent organic group). The manufacturing method for the organic thin film comprises a process forming a single monomolecular film by a reaction of a silyl group having A<SP>1</SP>-A<SP>3</SP>of the organic compound and a substrate surface, a process cleaning and removing the unreacted organic compound using a nonaqueous solvent, and a process accumulating the monomolecular film made of the organic compound using the unreacted silyl group existing on a film surface side of the monomolecular film as a site of an adsorption reaction. COPYRIGHT: (C)2006,JPO&NCIPI
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