发明名称 MASK, METHOD FOR MANUFACTURING MASK, METHOD FOR FORMING THIN-FILM PATTERN, AND METHOD FOR MANUFACTURING ELECTRO-OPTIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a mask which can mask an upsized region to be film-formed and economically maintain a high quality of a formed film; a method for manufacturing the mask; a method for forming a thin-film pattern; and a method for manufacturing an electro-optic device. SOLUTION: The mask 1 is formed of a plurality of chips 20 having a plurality of openings 22 jointed to a supporting substrate 10, wherein the chips 20 are made to be removable from the supporting substrate 10. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006077276(A) 申请公布日期 2006.03.23
申请号 JP20040260564 申请日期 2004.09.08
申请人 SEIKO EPSON CORP 发明人 KUWABARA TAKAYUKI;YOTSUYA SHINICHI
分类号 C23C14/04;C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/04
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