发明名称 |
MASK, METHOD FOR MANUFACTURING MASK, METHOD FOR FORMING THIN-FILM PATTERN, AND METHOD FOR MANUFACTURING ELECTRO-OPTIC DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a mask which can mask an upsized region to be film-formed and economically maintain a high quality of a formed film; a method for manufacturing the mask; a method for forming a thin-film pattern; and a method for manufacturing an electro-optic device. SOLUTION: The mask 1 is formed of a plurality of chips 20 having a plurality of openings 22 jointed to a supporting substrate 10, wherein the chips 20 are made to be removable from the supporting substrate 10. COPYRIGHT: (C)2006,JPO&NCIPI
|
申请公布号 |
JP2006077276(A) |
申请公布日期 |
2006.03.23 |
申请号 |
JP20040260564 |
申请日期 |
2004.09.08 |
申请人 |
SEIKO EPSON CORP |
发明人 |
KUWABARA TAKAYUKI;YOTSUYA SHINICHI |
分类号 |
C23C14/04;C23C14/24;H01L51/50;H05B33/10 |
主分类号 |
C23C14/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|