The present invention relates to the use of fullerols having the formula C<SUB>2x</SUB>(OH)<SUB>n</SUB> where x is at least 10 and n is at least 2 as resist materials. The invention also includes within its scope methods of patterning a fullerol-based resist layer.
申请公布号
WO2006030240(A2)
申请公布日期
2006.03.23
申请号
WO2005GB03606
申请日期
2005.09.19
申请人
THE UNIVERSITY OF BIRMINGHAM;ROBINSON, ALEX;PALMER, RICHARD, EDWARD
