发明名称 |
Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
摘要 |
An alignment apparatus including a first position measuring device and a second position measuring device which measure position information of an object to be controlled, a switching device which switches a position measuring system from the first position measuring device to the second position measuring device, depending on a moving area of the object to be controlled, a correction computing device which performs a correction calculation for a measurement result from the first position measuring device using a first correction parameter set to obtain a current position of the object to be controlled, a predicted coordinate computing unit which predicts coordinates of the object to be controlled on the basis of progress of a correction calculation result from the correction computing device, and a reverse correction computing device which performs a calculation for the coordinates predicted by the predicted coordinate computing unit using a second correction parameter set to obtain a command value for the second position measuring device.
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申请公布号 |
US7016049(B2) |
申请公布日期 |
2006.03.21 |
申请号 |
US20030460178 |
申请日期 |
2003.06.13 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KUROSAWA HIROSHI |
分类号 |
G01B9/02;G01B11/00;G03F7/20;G03F7/22;G03F9/00;H01L21/027 |
主分类号 |
G01B9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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