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发明名称
FABRICATION METHOD OF SEMICONDUCTOR DEVICE WITH MINIMIZED WAFER WARPAGE
摘要
申请公布号
KR20060024929(A)
申请公布日期
2006.03.20
申请号
KR20040073802
申请日期
2004.09.15
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KANG, DAE LIM
分类号
H01L21/31;H01L21/20
主分类号
H01L21/31
代理机构
代理人
主权项
地址
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