发明名称 Full sequence metal and barrier layer electrochemical mechanical processing
摘要 A method and apparatus for electrochemically processing metal and barrier materials is provided. In one embodiment, a method for electrochemically processing a substrate includes the steps of establishing an electrically-conductive path through an electrolyte between an exposed layer of barrier material on the substrate and an electrode, pressing the substrate against a processing pad assembly with a force less than about 2 psi, providing motion between the substrate and pad assembly in contact therewith and electrochemically removing a portion of the exposed layer during a first electrochemical processing step in a barrier processing station.
申请公布号 US2006057812(A1) 申请公布日期 2006.03.16
申请号 US20040941060 申请日期 2004.09.14
申请人 APPLIED MATERIALS, INC. 发明人 LIU FENG Q.;CHEN LIANG-YUH;TSAI STAN D.;HU YONGQI
分类号 H01L21/8222 主分类号 H01L21/8222
代理机构 代理人
主权项
地址