Fabricating method of semiconductor device,申请号KR20020086878-传众专利搜索

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发明名称	Fabricating method of semiconductor device
摘要
申请公布号	KR100560307(B1)	申请公布日期	2006.03.14
申请号	KR20020086878	申请日期	2002.12.30
申请人		发明人
分类号	H01L21/31;H01L21/768	主分类号	H01L21/31
代理机构		代理人
主权项
地址

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