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发明名称
METHOD FOR FABRICATING DUAL DAMASCENE PATTERN
摘要
申请公布号
KR100562307(B1)
申请公布日期
2006.03.13
申请号
KR20040106153
申请日期
2004.12.15
申请人
DONGBUANAM SEMICONDUCTOR INC.
发明人
JANG, JEONG YEL
分类号
H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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