METHOD FOR MANUFACTURING SHALLOW TRENCH ISOLATION LAYER OF THE SEMICONDUCTOR DEVICE,申请号KR20030072880-传众专利搜索

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发明名称	METHOD FOR MANUFACTURING SHALLOW TRENCH ISOLATION LAYER OF THE SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100559683(B1)	申请公布日期	2006.03.10
申请号	KR20030072880	申请日期	2003.10.20
申请人		发明人
分类号	H01L21/762	主分类号	H01L21/762
代理机构		代理人
主权项
地址

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