发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To reduce the load on workers while preventing lowering of the precision of the detection of an object. SOLUTION: A substrate processing apparatus is provided with a light projecting part 450a and a light receiving part 450b which constitute a detection sensor 450. The light receiving part 450b is shifted in the (+Z) direction from a position where laser beam emitted from the light projecting part 450a is received and arranged at a position where the reflection light reflected by the object is received. In the substrate processing apparatus, when the light receiving part 450b receives the laser beam, it is judged that the object is existed and a movement mechanism of a slit nozzle is controlled. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006061854(A) 申请公布日期 2006.03.09
申请号 JP20040248297 申请日期 2004.08.27
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 NISHIOKA KENTARO;TAKAGI YOSHINORI
分类号 B05C5/02;B05C11/00;G01B11/00 主分类号 B05C5/02
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