| 摘要 |
PROBLEM TO BE SOLVED: To raise a temperature of new liquid by the heat exchange of waste liquid and new liquid without mixing new liquid and waste liquid in a processing tank, to reduce energy and to shorten a chemical exchange time. SOLUTION: A semiconductor manufacturing device for cleaning a semiconductor substrate is provided with a high temperature circulation-type chemical tank 11 which is filled with a chemical supplied for cleaning the semiconductor substrate in a state that a temperature is raised to a processing temperature, in which the chemical after cleaning is circulated and reused, a bulb 21 discharging the chemical 12 in the chemical tank 11, an auxiliary liquid addition mechanism 32 heating waste liquid by adding auxiliary liquid generating heat by mixing with waste liquid to waste liquid being discharged liquid, a heat exchanger 31 in which heated waste liquid is temporarily stored and new liquid is circulated, waste liquid is cooled and the temperature of new liquid is raised by the heat exchange of waste liquid and new liquid, and piping supplying new liquid whose temperature is raised through the heat exchanger 31 into the chemical tank 11. COPYRIGHT: (C)2006,JPO&NCIPI
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