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发明名称
METHOD FOR PREVENTING OVERETCH OF PMD LAYER
摘要
申请公布号
KR20060020823(A)
申请公布日期
2006.03.07
申请号
KR20040069511
申请日期
2004.09.01
申请人
DONGBUANAM SEMICONDUCTOR INC.
发明人
SEO, BYOUNG YOON
分类号
H01L21/335;H01L21/304
主分类号
H01L21/335
代理机构
代理人
主权项
地址
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