| 摘要 |
<p>A method for preparing a surfactant-templated, mesoporous low dielectric film by mixing a siloxane-based polymer or oligomer, a surfactant and an organic solvent to prepare a coating solution, coating a substrate with the coating solution, and heat-curing the coated substrate. By the method, a thin film having a low dielectric constant and showing superior mechanical properties, such as hardness and modulus, can be prepared. Therefore, the low dielectric thin film can be applied to conductive materials, display materials, chemical sensors, biocatalysts, insulators, and packaging materials.</p> |
