| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate treatment equipment capable of suppressing the rebound of a process liquid dispersed from a rotating substrate. SOLUTION: On a spin base 10, a substrate W is held in a horizontal position and rotated. A processing liquid can be supplied to the lower surface of the substrate W from a lower side treatment liquid nozzle 15. Further, the top surface of the substrate W is covered with an atmosphere shielding board 30. A splash guard 50 is arranged such that the substrate W is surrounded thereby. A guard 52 is formed in a winding manner and the maximum inner diameter portion of a recovery port 52f is made to be close to a guard 53 such that the vertical cross-section of the recovery port 52f is made to be in a U shape opening toward the core of the splash guard 50. The spacing between the inner wall surface of the recovery port 52f and the substrate W is large and the rebound of the treatment liquid dispersed from the rotating substrate W can be suppressed. COPYRIGHT: (C)2006,JPO&NCIPI
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