发明名称 Apparatus for fabricating a semiconductor device
摘要 An apparatus for fabricating a semiconductor device, including an ultraviolet radiation source, a lamp house body surrounding the ultraviolet radiation source, the lamp house body carrying a mirror surface, an opening provided on the lamp house body, and a vacuum chuck provided on the lamp house body so as to cover the opening, the vacuum chuck being adapted for supporting a semiconductor substrate thereon in a state that the semiconductor substrate is covered by adhesive tape, wherein the vacuum chuck is formed of a material which is substantially transparent to ultraviolet radiation produced by the ultraviolet radiation source.
申请公布号 US7005650(B2) 申请公布日期 2006.02.28
申请号 US20020124267 申请日期 2002.04.18
申请人 FUJITSU LIMITED 发明人 YAMADA YUTAKA
分类号 H01T23/00;H01J27/24;H01L21/301;H01L21/78 主分类号 H01T23/00
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