发明名称 Method of fabricating stacked semiconductor chips
摘要 A groove is formed on a semiconductor substrate having integrated circuits and electrodes from a first surface. An insulating layer is formed on an inner surface of the groove. A conductive layer is formed on the insulating layer above the inner surface of the groove. A second surface of the semiconductor substrate opposite to the first surface is ground until the groove is exposed to divide the semiconductor substrate into a plurality of semiconductor chips in which the conductive layer is exposed on a side surface of each semiconductor chip. The semiconductor chips are then stacked. The conductive layer of one of the semiconductor chips is electrically connected to the conductive layer of another one of the semiconductor chips.
申请公布号 US7005324(B2) 申请公布日期 2006.02.28
申请号 US20030661372 申请日期 2003.09.12
申请人 SEIKO EPSON CORPORATION 发明人 IMAI TAKAHIRO
分类号 H01L21/48;H01L25/18;H01L21/44;H01L21/56;H01L21/60;H01L21/768;H01L21/78;H01L23/31;H01L25/065;H01L25/07 主分类号 H01L21/48
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