METHOD FOR MANUFACTURING TWO-DIMENSIONAL IMAGE DETECTOR

摘要

PROBLEM TO BE SOLVED: To prevent an active element array and a semiconductor layer from deteriorating in performance caused in a manufacturing process for a two-dimensional image detector. SOLUTION: A TFT array is formed on a glass substrate (step P1). A surface protection layer is formed on the glass substrate so as to cover the TFT array (step P2). The glass substrate is divided to form active matrix substrates while the surface protection layer is formed (step P3). The divided active matrix substrate is chamfered along its edges (step P4). The surface protection layer is removed from the active matrix substrate (step P5). An X-ray conductive layer is formed on the TFT array where the surface protection layer has been removed (step P6). By these steps, contaminations produced during the division and chamfering of the glass substrate are prevented from contaminating the TFT array and the X-ray conductive layer. COPYRIGHT: (C)2006,JPO&NCIPI