Plasma source for depositing layers on materials, cleaning and etching has power supply connected to electromagnetic radiation generator under gas supply and plasma volume

摘要

The plasma source is accommodated in a chamber (16) with a cylindrical inward projection (12) with a power source (14) at its outer end. Connectors (23) hold an electromagnetic radiation generator (13) under the closed end of the projection. There is a gap (33) above the closed end and a plasma dark space (21). A gas inlet body (20) is positioned over the dark space. Plasma (17,30) is generated between the gas inlet body and a substrate (19) with a reaction surface (18).