发明名称 Method of forming vias on a wafer stack using laser ablation
摘要 Disclosed are various embodiments of a method of forming vias for backside connections in a wafer stack, wherein the vias are formed by non-thermal laser ablation. Other embodiments are described an claimed.
申请公布号 US2006040471(A1) 申请公布日期 2006.02.23
申请号 US20040922708 申请日期 2004.08.20
申请人 发明人 RAMANATHAN SHRIRAM;LI ERIC J.
分类号 H01L21/30;H01L21/46 主分类号 H01L21/30
代理机构 代理人
主权项
地址