发明名称 Exposure device
摘要 A laser exposure device at which alignment marks of a plate material on an exposure stage, which is moving in a direction opposite to a scanning direction, are read by a CCD camera mounted at a support gate, after which an imaging region, whose position is judged using the alignment marks, is exposed by a laser beam from a laser scanner. Here, a distance along the scanning direction from the CCD camera to the laser scanner is not less than a pitch of the alignment marks that are provided to respectively correspond to a trailing end and a leading end of the imaging region. According to this laser exposure device, even in a case in which a plurality of the imaging region is provided at a recording medium, an increase in a duration for forming images on the recording medium in accordance with an increase in imaging regions is prevented.
申请公布号 US2006033906(A1) 申请公布日期 2006.02.16
申请号 US20050132332 申请日期 2005.05.19
申请人 发明人 OZAKI TAKAO;WADA KOJI
分类号 G03B27/32 主分类号 G03B27/32
代理机构 代理人
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