发明名称 METHOD OF MANUFACTURING APPRAISAL SAMPLE FOR SILICON INGOT
摘要 A method for fabricating an inspection sample of a silicon ingot is provided to guarantee a horizontal margin of a wafer sample in a polishing process for transforming a quadrangular silicon ingot sample into a type of a wafer sample by adding a carbon or ceramic beam to both sidewalls of a silicon ingot wherein the carbon or ceramic beam has similar strength to silicon. A silicon ingot of a cylindrical type is grown. The silicon ingot is firstly sliced into a block of a cylindrical type. Support members are attached to one and the other sides of the silicon ingot block(102) of the sliced cylindrical type. The silicon ingot block to which a beam(104) is attached is secondly sliced in a direction of a crystal axis to form a quadrangular sample. Every corner of the resultant quadrangular sample is polished to form a cylindrical sample of a wafer type. The support member can form one of a cram or ceramic beam.
申请公布号 KR20080088994(A) 申请公布日期 2008.10.06
申请号 KR20070031936 申请日期 2007.03.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 AN, JEONG HOON
分类号 C30B29/06 主分类号 C30B29/06
代理机构 代理人
主权项
地址
您可能感兴趣的专利