| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a substrate for an electrooptic apparatus by which the occurrence of interference fringes is completely prevented without increasing costs, and to provide a manufacturing method for the electrooptic apparatus, the substrate for the electrooptic apparatus and the electrooptic apparatus. <P>SOLUTION: In a manufacturing step of the substrate for the electrooptic apparatus of a liquid crystal device 100, when a positive photosensitive resin 138 is exposed by using an exposure mask 210 provided with a plurality of light shielding parts 211, 212 and 213 for forming projecting parts having light shielding levels different from each other and then developed, a plurality of projecting parts 131, 132 and 133 having height dimensions different from each other are formed. Consequently, when a reflection layer is formed on the surface of the photosensitive resin 138, a plurality of projecting parts having height dimensions different from each other are intermingled in projecting parts for light scattering formed on the surface of the reflection layer. Thereby, the occurrence of interference fringes can be prevented and the plurality of projecting parts having the height dimensions different from each other can be formed by using the single exposure mask 210. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
