发明名称 EQUIPMENT AND METHOD FOR PROCESSING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide equipment for processing the central part and the outer circumferential part of a rotary driven substrate substantially uniformly with processing liquid imparted with ultrasonic vibration. SOLUTION: The equipment for processing the upper surface of a substrate rotary driven under horizontal state with processing liquid imparted with ultrasonic vibration comprises a body 32 having branch channels 35a-35c for supplying processing liquid from the radially central part to the peripheral part on the upper surface of the rotating substrate, a junction 36, a collective channel 37 and a spread groove 38, and a vibrator 34 provided in the body in order to impart ultrasonic vibration to the processing liquid being supplied onto the upper surface of the substrate, and increasing the ultrasonic vibration imparting area for the processing liquid depending on variation in circumferential speed which increases from the rotational central part toward the peripheral part of the substrate. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006040956(A) 申请公布日期 2006.02.09
申请号 JP20040214713 申请日期 2004.07.22
申请人 SHIBAURA MECHATRONICS CORP 发明人 OSADA TAKESHI
分类号 H01L21/304;B08B3/12;H01L21/027 主分类号 H01L21/304
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