发明名称 METHOD FOR FORMING THIN FILM, METHOD FOR MANUFACTURING DEVICE AND STAGE DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent dry irregularity generated when a substrate is adsorbed to a stage to carry out drying in a thin film forming process using a liquid droplet discharge method. SOLUTION: A stage device is used for adsorbing to hold the substrate 11 when a droplet placed on the substrate 11 is dried. The stage device includes a mounting table 4 on which an adsorption hole 4a is formed to adsorb the substrate 11, wherein the adsorption hole 4a is placed on an area other than the thin film formation area F of the substrate 11. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006026521(A) 申请公布日期 2006.02.02
申请号 JP20040208515 申请日期 2004.07.15
申请人 SEIKO EPSON CORP 发明人 HIRUMA TAKASHI
分类号 B05D1/26;B05D3/02;G02B5/20;H01L51/50;H05B33/10 主分类号 B05D1/26
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