POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

A positive resist composition comprising a substrate for pattern creating material (A) containing a protected form (X1) of polyhydric phenol compound (x) of 300 to 2500 molecular weight having two or more phenolic hydroxyls wherein the phenolic hydroxyls are partially protected by an acid-dissociative dissolution inhibiting group and an acid generator component (B) capable of generating an acid upon exposure, wherein the component (B) contains an onium salt acid generator (B1) having an alkylsulfonate ion as an anion.