发明名称 POLISHING PAD AND METHOD FOR PRODUCING SAME
摘要 <p>A transparent pad having a polishing surface with an average surface roughness of 5�m or less is used as a polishing pad. An indentation is formed on the back surface of the transparent pad such that its rate of light transmission is locally changed. The transparent pad has a rate of light transmission equal to or greater than 10% or preferably 30% for light of at least one wavelength in the range of 350nm-900nm.</p>
申请公布号 EP1622193(A1) 申请公布日期 2006.02.01
申请号 EP20040726616 申请日期 2004.04.08
申请人 NIHON MICROCOATING CO., LTD. 发明人 OHNO, HISATOMO;IZUMI, TOSHIHIRO;SAITO, MITSURU;NAGAMINE, TAKUYA;MILLER, CLAUGHTON;KODAKA, ICHIRO
分类号 B24B37/20;B24B37/24;B24B37/26;H01L21/304;(IPC1-7):H01L21/304;B24B37/00 主分类号 B24B37/20
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